Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2006-09-05
2006-09-05
Schilling, Richard L. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S326000, C430S905000, C430S910000, C526S257000, C526S281000, C528S040000, C549S014000, C549S273000, C549S295000, C549S320000, C549S323000
Reexamination Certificate
active
07101654
ABSTRACT:
The disclosed invention relates to novel norbornene-type monomers containing pendent lactone or sultone groups. The invention also relates to norbornene-type polymers and copolymers comprising one or more repeating units represented by the formula:and containing pendent lactone or sultone groups. These polymers and copolymers are useful in making photoimagable materials. The photoimagable materials are particularly suitable for use in photoresist compositions useful in 193 and 157 nm photolithography.
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Rhodes Larry F.
Seger Lawrence
Wu Xiaoming
Berman Bernard
Promerus LLC
Schilling Richard L.
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