Nonvolatile semiconductor memory device, manufacturing...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S317000

Reexamination Certificate

active

06888194

ABSTRACT:
Nonvolatile memory elements are disclosed which can have increased capacity, reduced operating voltage and/or faster operating speeds. According to one embodiment, a nonvolatile memory element can include a first diffusion layer (2) and a second diffusion layer (3) formed in a main surface of a substrate (1). A laminate film can be formed near a first diffusion layer (2) and/or a second diffusion layers (3) that includes a first insulating film (4aor4), a second insulating film (5aor5), and a third insulating film (6aor6). A gate insulating film (7) can be formed a channel region and gate electrode (8) can be formed to cover gate insulating film (7) and the laminate film(s) that has a T-shape. A gate electrode (8) can have end portions that sandwich a first insulating film (4aor4), a second insulating film (5aor5), and a third insulating film (6aor6) with a first diffusion layer (2) and/or second diffusion layer (3).

REFERENCES:
patent: 5768192 (1998-06-01), Eitan
patent: 5838041 (1998-11-01), Sakagami et al.
patent: 6798028 (2004-09-01), Horstmann et al.
patent: 6828618 (2004-12-01), Baker et al.
“Twin MONOS Cell with Dual Control Gates”,2000 Symposium on VLSI Technology Digest of Technical Papers, pp. 122-123, by Yutaka Hayashi et al.

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