Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2006-04-11
2006-04-11
Loke, Steven (Department: 2811)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S316000, C257S324000
Reexamination Certificate
active
07026683
ABSTRACT:
A plurality of nonvolatile memory elements formed on element regions respectively isolated by element isolation regions on a main surface of a first conductive type semiconductor substrate, the nonvolatile semiconductor memory elements comprising a gate insulating film formed on the main surface of the semiconductor substrate, a plurality of floating electrodes formed along a first direction on the gate insulating film, a plurality of grooves formed among the plurality of floating electrodes, groove insulating films filled in the plurality of the grooves, a second conductive type impurity diffusion region formed along a second direction so as to sandwich the floating electrodes, interelectrode insulating films formed along the first direction on the plurality of floating electrodes and the groove insulating films, and control electrodes formed on the interelectrode insulating films.
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Notification of Reasons for Rejection dated May 10, 2005, issued by the Japanese Patent Office in counterpart Japanese Application No. 2003-107991 and English language translation thereof.
Decision of Rejection dated Dec. 6, 2005, issued by the Japanese Patent Office in counterpart Japanese Application No. 2003-107991, and English language translation thereof.
Mori Seiichi
Sonoda Masahisa
Tsunoda Hiroaki
Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Kabushiki Kaisha Toshiba
Loke Steven
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