Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2007-03-20
2010-11-30
Phung, Anh (Department: 2824)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S314000, C257S316000, C257SE29300
Reexamination Certificate
active
07842992
ABSTRACT:
It is an object to provide a nonvolatile semiconductor memory device with an excellent writing property and charge-retention property. A semiconductor layer including a channel forming region between a pair of impurity regions which are formed to be apart from each other is provided. In an upper layer portion thereof, a first insulating layer, a floating gate electrode, a second insulating layer, and a control gate electrode are provided. The floating gate has at least a two-layer structure, and a first layer being in contact with the first insulating layer preferably has a band gap smaller than that of the semiconductor layer. The stability of the first layer is improved by formation of a second layer of the floating gate electrode using a metal, an alloy, or a metal compound material. Such a structure of the floating gate electrode can improve injectability of carriers in writing and a charge-retention property.
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Asami Yoshinobu
Furuno Makoto
Takano Tamae
Yamazaki Shunpei
Bernstein Allison P
Phung Anh
Robinson Eric J.
Robinson Intellectual Property Law Office P.C.
Semiconductor Energy Laboratory Co,. Ltd.
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