Nonvolatile semiconductor memory device and method of...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S508000, C257S510000, C257SE29020, C257SE21546, C257SE21661, C438S296000, C438S435000

Reexamination Certificate

active

07812391

ABSTRACT:
A nonvolatile semiconductor memory device includes a semiconductor substrate having a plurality of active regions separately formed by a plurality of trenches formed in a surface of the substrate at predetermined intervals, a first gate insulating film formed on an upper surface of the substrate corresponding to each active region, a gate electrode of a memory cell transistor formed by depositing an electrical charge storage layer formed on an upper surface of the gate insulating film, a second gate insulating film and a control gate insulating film sequentially, an element isolation insulating film buried in each trench and formed from a coating type oxide film, and an insulating film formed inside each trench on a boundary between the semiconductor substrate and the element isolation insulating film, the insulating film containing nontransition metal atoms and having a film thickness not more than 5 Å.

REFERENCES:
patent: 2002/0197823 (2002-12-01), Yoo et al.
patent: 2006/0183296 (2006-08-01), Yoo et al.
patent: 2006/0214258 (2006-09-01), Kiyotoshi
patent: 2006-269789 (2006-10-01), None

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