Nonvolatile semiconductor memory device and method of...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S314000, C257S325000, C257S410000, C257S411000, C257S321000, C257S390000

Reexamination Certificate

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07105888

ABSTRACT:
A first insulating layer, a second insulating layer, a third insulating layer, a first conductive layer, and an oxidation inhibitor film are successively deposited on a surface of a semiconductor substrate. After the oxidation inhibitor film and the first conductive layer are processed into strips, the assembly is thermally oxidized using the oxidation inhibitor film and the first conductive layer as a mask, thus forming thermal oxide films on first and second diffused layers. Then, a second conductive film is formed over the thermal oxide films and the first conductive layer, and then processed into a desired shape thereby to form an interconnection layer.

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