Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2009-03-20
2011-12-06
Li, Meiya (Department: 2811)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S296000, C257S301000, C257S302000, C257S303000, C257S330000, C257S405000, C257S406000, C257SE29170, C257SE29257, C257SE29309, C257SE27071, C257SE21210, C257SE21679, C438S243000, C438S259000, C438S261000, C438S270000, C438S386000, C438S589000, C438S591000
Reexamination Certificate
active
08072024
ABSTRACT:
A nonvolatile semiconductor memory device with a substrate. A plurality of dielectric films and electrode films are alternately stacked on the substrate and have a through hole penetrating in the stacking direction. A semiconductor pillar is formed inside the through hole. A charge storage layer is provided at least between the semiconductor pillar and the electrode film. At least part of a side surface of a portion of the through hole located in the electrode film is sloped relative to the stacking direction.
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Ishikawa Masao
Yahashi Katsunori
Kabushiki Kaisha Toshiba
Li Meiya
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
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