Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2011-01-25
2011-01-25
Pert, Evan (Department: 2826)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S315000, C257S321000, C257S325000, C257SE21210, C257SE29309
Reexamination Certificate
active
07875925
ABSTRACT:
A nonvolatile semiconductor memory device includes a source region and a drain region spaced from each other in a surface of a semiconductor layer, a tunnel insulating film provided on the semiconductor layer between the source region and the drain region, a charge storage film provided on the tunnel insulating film, a block insulating film provided on the charge storage film, and a control gate electrode provided on the block insulating film. The block insulating film is made of (Rm1−xLnx)2−yAlyO3+δ, where Ln is one or more selected from Pr, Tb, Ce, Yb, Eu, and Sm, Rm is one or more selected from La, Nd, Gd, Dy, Ho, Er, Tm, Lu, Y, and Sc, 0<x<0.167 (but 0<x<0.333 if Ln is Pr, and 0<x<0.292 if Ln is Tb), 0.95≦y≦1.20, and 0≦δ≦x(2−y)/2 (but −x(2−y)/2≦δ≦0 if Ln is Yb, Eu, and Sm, 0≦δ≦x(2−y)/3 if Ln is Pr, and 0≦δ≦3x(2−y)/14 if Ln is Tb).
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Kabushiki Kaisha Toshiba
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
Pert Evan
Wilson Scott
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