Nonvolatile memory device and fabrication method thereof

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate

Reexamination Certificate

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Details

C257S001000, C257S002000, C257S003000, C257S004000, C257S005000, C257SE21002, C257SE29002

Reexamination Certificate

active

07811905

ABSTRACT:
A nonvolatile memory device and a method for its fabrication may ensure uniform operating characteristics of ReRAM. The ReRam may include a laminated resistance layer that determines phase of ReRAM on an upper edge of a lower electrode for obtaining a stable threshold drive voltage level.

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