Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1984-04-16
1987-03-03
Chatmon, Saxfield
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
31323131, 31323141, 31511131, 31511181, H01J 724, H05B 3126
Patent
active
046478183
ABSTRACT:
Apparatus and method for producing a plurienergetic electron beam source. The apparatus includes a housing which functions as an anode, the same having an electron emission window covered by an electron-transparent grid, a cathode body mounted within the housing and electrically isolated therefrom, the spacing between the cathode body and grid being sufficient to permit a gas discharge to be maintained between them having a plasma region substantially thinner than the cathode sheath region. The method involves the simultaneous feeding of gas between a cathode body and an anode grid, applying voltages of about 10 kV to 20 kV and regulating the gas feed rate and the voltage to maintain a discharge condition of the character described above.
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Chatmon Saxfield
SFE Technologies
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