Nonsolvate-form crystal of polymethine compound and process...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

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C430S270150, C430S944000

Reexamination Certificate

active

07485404

ABSTRACT:
A novel nonsolvate-form crystal of polymethine compound is provided which has good stability in solution, shows a high gram extinction coefficient, is excellent in storage stability, is easy to handle and is highly sensitive to general-purpose semiconductor lasers.Thus is provided a nonsolvate-form crystal of polymethine compound of the formula (I) given below as well as a process for producing the nonsolvate-form crystal of polymethine compound of formula (I) which comprises reacting a polymethine ether compound of the formula (II) given below with hydrochloric acid or hydrobromic acid.(In the above formula, X represents Cl or Br.)(In the above formula, R represents an alkyl group, an alkoxyalkyl group or an optionally substituted aryl group.)

REFERENCES:
patent: 4973572 (1990-11-01), DeBoer
patent: 5386058 (1995-01-01), Mader
patent: 1074889 (2001-02-01), None
patent: 1101607 (2001-05-01), None
patent: 2002-356069 (2002-12-01), None
patent: 2004029191 (2004-01-01), None
patent: WO-01/07524 (2001-02-01), None
patent: WO-2005/000814 (2005-01-01), None

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