Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1987-05-28
1988-08-30
Michl, Paul R.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430312, 430319, 430270, G03C 500
Patent
active
047676957
ABSTRACT:
A new method for lithographically patterning nonplanar substrates is disclosed. In accordance with this method, a nonplanar substrate surface is patterned by initially substantially conformably coating the surface with a resist. Conformality is achieved by depositing the resist either from the vapor phase or from a mist. In addition, the motions of the constituents of the vapor or mist should be sufficiently random so that the angular flux distribution at any point on the nonplanar substrate surface to be coated is substantially identical to that at any other point to be coated.
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Ong Edith T. T.
Tai King L.
Wong Yiu-Huen
American Telephone and Telegraph Company AT&T Bell Laboratories
Doody Patrick A.
Michl Paul R.
Tiegerman Bernard
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