Noninvasive method for characterizing and identifying...

Optics: measuring and testing – With sample preparation – Depositing particles on optical surface

Reexamination Certificate

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C356S601000

Reexamination Certificate

active

10877262

ABSTRACT:
The invention relates to a method for noninvasively characterizing embedded micropatterns which are hidden under the surface of a wafer down to 100 μm. The micropatterns are identified with reference micropatterns from a previously produced reference library with the aid of their specific ellipsometric parameters.

REFERENCES:
patent: 6233046 (2001-05-01), Alba et al.
patent: 2002/0180986 (2002-12-01), Nikoonahad et al.
patent: 2003/0058443 (2003-03-01), Xu et al.
patent: EP 1 253 418 (2002-10-01), None

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