Non-volatile semiconductor storage device

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S326000, C257SE29309, C257SE21423, C438S287000

Reexamination Certificate

active

07977733

ABSTRACT:
A non-volatile semiconductor storage device includes: a memory cell area in which a plurality of electrically rewritable memory cells are formed; and a peripheral circuit area in which transistors that configure peripheral circuits to control the memory cells are formed. The memory cell area has formed therein: a semiconductor layer formed to extend in a vertical direction to a semiconductor substrate; a plurality of conductive layers extending in a parallel direction to, and laminated in a vertical direction to the semiconductor substrate; and a property-varying layer formed between the semiconductor layer and the conductive layers and having properties varying depending on a voltage applied to the conductive layers. The peripheral circuit area has formed therein a plurality of dummy wiring layers that are formed on the same plane as each of the plurality of conductive layers and that are electrically separated from the conductive layers.

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U.S. Appl. No. 12/244,307, filed Oct. 2, 2008, Makoto Mizukami, et al.
U.S. Appl. No. 12/508,904, filed Jul. 24, 2009, Kamigaichi, et al.

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