Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Patent
1995-02-09
1996-04-23
Ngo, Ngan V.
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
257316, 257401, H01L 29788, H01L 2976
Patent
active
055106390
ABSTRACT:
A non-volatile semiconductor memory cell having a novel structure is provided. The memory cell has a ring-shaped channel region formed on a semiconductor substrate, a drain region formed in a zone surrounded by the channel region, and a source region formed outside the channel region. The cell further includes a first gate insulation layer formed on the substrate in such a manner as to cover the boundary between the channel region and the drain region, a ring-shaped floating gate electrode formed on the first gate insulation layer, a second gate insulation layer formed on the floating gate electrode; and a control gate electrode which is capacitive-coupled with the floating gate via the second gate insulation layer.
REFERENCES:
patent: 4290077 (1981-09-01), Ronen
patent: 4561168 (1985-12-01), Pitzer et al.
patent: 4845539 (1989-07-01), Inoue
patent: 4990980 (1991-02-01), Wada
patent: 5053842 (1991-10-01), Kojima
EPO Search Report (94101463.1) dated Dec. 15, 1994.
Ichikawa Youhei
Nakao Ichiro
Odake Yoshinori
Okuda Yasushi
Matsushita Electric - Industrial Co., Ltd.
Ngo Ngan V.
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