Non-volatile semiconductor memory device and manufacturing...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S318000, C257S322000

Reexamination Certificate

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07053440

ABSTRACT:
A non-volatile semiconductor memory device comprising: a first conductive type well formed within a semiconductor substrate; and a memory cell having a gate insulating film, a floating gate, an insulating film, a control gate and a pair of source/drain region, the gate insulating film, the floating gate, the insulating film, the control gate being layered in this order above the first conductive type well, the pair of source/drain regions being made up of second conductive type diffusion layers and formed within the first conductive type well, wherein the source region is electrically connected to the first conductive type well.

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patent: 6730959 (2004-05-01), Hung et al.
patent: 6844588 (2005-01-01), Cavins et al.
patent: 2004/0031996 (2004-02-01), Brian Li et al.
patent: 10-074915 (1998-03-01), None

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