Non-volatile semiconductor memory cell and method for production

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

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257310, 257325, 438 3, 365145, H01L 2976, H01L 2994, H01L 31062, H01L 31113

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active

057808864

ABSTRACT:
A non-volatile semiconductor memory cell employing a field effect transistor having a gate of the metal/ferroelectric structure or the metal/ferroelectric/metal/insulator insulator structure, wherein the ferroelectric layer is a layer of bismuth titanate containing bismuth more than the stoichiometric quantity or a piled layer of bismuth titanate of the stoichiometric composition and bismuth titanate containing bismuth more than the stoichiometric quantity, both of which have a less amount of dielectric constant and remanent polarization, thereby enabling the non-volatile memory cell to memorize and erase binary information with a less amount of voltage to be applied to the gate.

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"A Single-Transistor Ferroelectric Memory Cell", Takashi Nakamura et al., ISSCC95, pp. 68-70, Feb. 15, 1995.
P.C. Joshi et al., "Rapid Thermally Processed Ferroelectric BI4TI3012 Thin Films," Journal of Applied Physics, vol. 72, No. 11, 1 Dec. 1992, pp. 5517-5519.
Patent Abstracts of Japan, vol. 095, No. 007, 31 Aug. 1995 & JP 07 099257 A (Ricoh Co Ltd), 11 Apr. 1995.
B.J. Liddiard, "Ferroelectric Memories: An Emerging Techjnology," Wescon Technical Papers, vol. 35, 1 Nov. 1991, pp. 390-393.

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