Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1998-01-28
2000-04-11
Baxter, Janet
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430325, 4302811, 522 8, 522 37, 549465, 560 9, 560 53, G03C 1492, C08F 246, C07D30793, C07C321100
Patent
active
060486600
ABSTRACT:
Compounds of the formula I ##STR1## in which R.sub.1 and R.sub.2 independently of one another are, for example, a group of the formula II ##STR2## R.sub.3, R.sub.4, R.sub.5, R.sub.6 and R.sub.7 independently of one another are, for example, hydrogen, C.sub.1 -C.sub.12 alkyl, OR.sub.8, SR.sub.9, NR.sub.10 R.sub.11, halogen or phenyl; R.sub.8, R.sub.9, R.sub.10, R.sub.11 independently of one another are, for example, hydrogen or C.sub.1 -C.sub.12 alkyl; R.sub.12 is, for example, C.sub.1 -C.sub.8 alkyl; R.sub.13 is, for example, C.sub.1 -C.sub.12 alkyl; R.sub.14 is, for example, hydrogen; Y is C.sub.1 -C.sub.12 alkylene, C.sub.4 -C.sub.8 alkenylene, C.sub.4 -C.sub.8 alkynylene or cyclohexylene, or is phenylene or C.sub.4 -C.sub.40 alkylene interrupted one or more times by --O--, --S-- or --NR.sub.15 --, or Y is a group of the formula III, IV, V, VI, VII, VIII, IX, X or XI ##STR3## Y.sub.1 is as defined for Y with the exception of the formula V; R.sub.15 is hydrogen, C.sub.1 -C.sub.12 alkyl or phenyl; and R.sub.16 is hydrogen, CH.sub.2 OH or C.sub.1 -C.sub.4 alkyl; and mixtures of these compounds with further photoinitiators are suitable for photopolymerizing compounds having ethylenically unsaturated double bonds.
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Kohler Manfred
Leppard David George
Ashton Rosemary
Baxter Janet
Ciba Specialty Chemicals Corporation
Hall Luther A.R.
Mansfield Kevin T.
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