Semiconductor device manufacturing: process – Forming bipolar transistor by formation or alteration of... – Self-aligned
Reexamination Certificate
2008-04-22
2008-04-22
Luu, Chuong A. (Department: 2818)
Semiconductor device manufacturing: process
Forming bipolar transistor by formation or alteration of...
Self-aligned
C438S257000, C438S637000, C438S775000
Reexamination Certificate
active
07361567
ABSTRACT:
A nanocrystal non-volatile memory (NVM) has a dielectric between the control gate and the nanocrystals that has a nitrogen content sufficient to reduce the locations in the dielectric where electrons can be trapped. This is achieved by grading the nitrogen concentration. The concentration of nitrogen is highest near the nanocrystals where the concentration of electron/hole traps tend to be the highest and is reduced toward the control gate where the concentration of electron/hole traps is lower. This has been found to have the beneficial effect of reducing the number of locations where charge can be trapped.
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Muralidhar Ramachandran
Rao Rajesh A.
White Bruce E.
Clingan, Jr. James L.
Freescale Semiconductor Inc.
Hill Daniel D.
Luu Chuong A.
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