Non-volatile memory cell and method of programming

Static information storage and retrieval – Floating gate – Particular biasing

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36518528, 36518529, G11C 1134

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active

058869280

ABSTRACT:
The programming time of a non-volatile memory cell (13) is reduced by forming the non-volatile memory cell (13) in a well region (12). The presence of the well region (12) increases the number of electrons that are present in a channel region (14) of the non-volatile memory cell (13). The number of electrons in the channel region (14) is also increased by placing a voltage potential on the well region (12) relative to a source region (15). The voltage differential will inject electrons into the well region (12), which increases the number of electrons in the channel region (14).

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S. Zhao et al., "P-Well Bias Dependence of Electron Trapping in Gate Oxide of n-MOSFETs During Substrate Hot-Electron Injection. " Electronics Letters, Oct. 22,1992, vol. 28, No. 22, pp. 2080-2082.

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