Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2005-04-12
2005-04-12
Abraham, Fetsum (Department: 2826)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S316000, C257S317000, C257S318000
Reexamination Certificate
active
06878984
ABSTRACT:
A structure of a non-volatile flash memory, in which a punch-through current is suppressed and the area of a memory cell is reduced, is provided. The non-volatile flash memory being a NOR type non-volatile flash memory provides floating gates and a common source line, and drains. And at the structure of the non-volatile flash memory, a region overlapped one of the drains and one of the floating gates in a memory cell is larger than a region overlapped the common source and one of the floating gates in the memory cell.
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M. Kato et al., “A Shallow-Trench-Isaolation Flash Memory Technology with a Source-Bias Programming Method”, 1996,IEEE Technical Digest of IEDM, pp. 177-180.
Abraham Fetsum
NEC Electronics Corporation
Young & Thompson
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