Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1994-06-30
1997-10-07
Lesmes, George F.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
4302871, 430906, 430935, G03C 173
Patent
active
056746601
ABSTRACT:
An electrodepositable photoresist composition comprising an aqueous dispersion of: (a) a water-dispersible neutralized cationic polymeric material having a pendant unsaturation, (b) a nonionic unsaturated material and (c) a photoinitiator; characterized in that it can form smooth, thin and pinhole free coatings and further characterized in that the film is capable of being selectively insolubilized by patterned radiation exposure such that the unexposed portion of the film is soluble in dilute aqueous acid and the exposed portion is insoluble in said aqueous acid.
REFERENCES:
patent: 3501391 (1970-03-01), Smith et al.
patent: 3738835 (1973-06-01), Bakos
patent: 3894922 (1975-07-01), Bosso et al.
patent: 3935087 (1976-01-01), Jerabek et al.
patent: 3936368 (1976-02-01), Watanabe et al.
patent: 3936405 (1976-02-01), Sturni et al.
patent: 3937679 (1976-02-01), Bosso et al .
patent: 3954587 (1976-05-01), Kokawa
patent: 3959106 (1976-05-01), Bosso et al.
patent: 4038232 (1977-07-01), Bosso et al.
patent: 4039414 (1977-08-01), McGinniss
patent: 4066523 (1978-01-01), McGinniss
patent: 4105518 (1978-08-01), McGinniss
patent: 4166017 (1979-08-01), McGinniss
patent: 4321304 (1982-03-01), Castellucci
patent: 4338232 (1982-07-01), Harris et al.
patent: 4592816 (1986-06-01), Emmons et al.
patent: 4601916 (1986-07-01), Arachtingi
patent: 4632891 (1986-12-01), Banks et al.
patent: 4632900 (1986-12-01), Demmer et al.
patent: 4671854 (1987-06-01), Ishikawa et al.
patent: 4673458 (1987-06-01), Ishikawa et al.
patent: 4746399 (1988-05-01), Demmer et al.
patent: 4751172 (1988-06-01), Rodriguez et al.
patent: 4760013 (1988-07-01), Hacker et al.
patent: 4828948 (1989-05-01), Ahne et al.
patent: 4839253 (1989-06-01), Demmer et al.
patent: 4845012 (1989-07-01), Seko et al.
patent: 4861438 (1989-08-01), Banks et al.
patent: 4863757 (1989-09-01), Durand
patent: 4863827 (1989-09-01), Jain et al.
patent: 4863828 (1989-09-01), Kawabe et al.
patent: 4863829 (1989-09-01), Furuta et al.
patent: 4877818 (1989-10-01), Emmons et al.
patent: 4883571 (1989-11-01), Kondo et al.
patent: 4888269 (1989-12-01), Sato et al.
patent: 4898656 (1990-02-01), Hoshino et al.
patent: 4975347 (1990-12-01), Ahne et al.
patent: 5002858 (1991-03-01), Demmer et al.
patent: 5102775 (1992-04-01), Okuhara et al.
Kahle, II Charles F.
Nakajima Masayuki
Olson Kurt G.
Sandala Michael G.
Zawacky Steven R.
Chirgott Paul S.
Lesmes George F.
Millman Dennis G.
PPG Industries Inc.
Weiner Laura
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