Non-contact optical techniques for measuring surface conditions

Thermal measuring and testing – Temperature measurement – Combined with diverse art device

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25022714, 250239, 356 43, 374 9, 374128, 374131, G01J 508, G01J 516

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053102606

ABSTRACT:
Thermal, optical, physical and chemical characteristics of a substrate (11) surface are determined with non-contact optical techniques that include illuminating (23) the surface with radiation having a ripple intensity characteristic (51), and then measuring the combined intensities (53) of that radiation after modification by the substrate surface and radiation emitted from the surface. Precise determinations of emissivity, reflectivity, temperature, changing surface composition, the existence of any layer formed on the surface and its thickness are all possible from this measurement. They may be made in situ and substantially in real time, thus allowing the measurement to control (39, 41) various processes of treating a substrate surface. This has significant applicability to semiconductor wafer processing and metal processing.

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