Non-contact optical techniques for measuring surface conditions

Thermal measuring and testing – Distance or angle – Thickness – erosion – or deposition

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374121, 374127, 374128, 374133, 364557, G01B 1106, G01J 506, H01L 2166

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054907284

ABSTRACT:
Thermal, optical, physical and chemical characteristics of a substrate (11) surface are determined with non-contact optical techniques that include illuminating (23) the surface with radiation having a ripple intensity characteristic (51), and then measuring the combined intensities (53) of that radiation after modification by the substrate surface and radiation emitted from the surface. Precise determinations of emissivity, reflectivity, temperature, changing surface composition, the existence of any layer formed on the surface and its thickness are all possible from this measurement. They may be made in situ and substantially in real time, thus allowing the measurement to control (39, 41) various processes of treating a substrate surface. This has significant applicability to semiconductor wafer processing and metal processing.

REFERENCES:
patent: 2709367 (1955-05-01), Bohnet
patent: 3288625 (1966-11-01), Kauer
patent: 3586851 (1971-06-01), Rudolph
patent: 3686940 (1972-08-01), Kockott
patent: 3698813 (1972-10-01), Aisenberg
patent: 3971939 (1976-07-01), Andressen
patent: 4101759 (1978-07-01), Anthony et al.
patent: 4222663 (1980-09-01), Gebhart et al.
patent: 4236075 (1980-11-01), Nexo
patent: 4254455 (1981-03-01), Neal, Jr.
patent: 4408827 (1983-10-01), Guthrie
patent: 4417822 (1983-11-01), Stein et al.
patent: 4437772 (1984-03-01), Samulski
patent: 4540293 (1985-09-01), Shores
patent: 4576486 (1986-03-01), Dils
patent: 4579461 (1986-04-01), Rudolph
patent: 4579463 (1986-04-01), Rosenowarg
patent: 4632908 (1986-12-01), Schultz
patent: 4745291 (1988-05-01), Niiya
patent: 4750139 (1988-06-01), Dils
patent: 4752127 (1988-06-01), Zafred
patent: 4752141 (1988-06-01), Sun et al.
patent: 4796985 (1989-01-01), Onanian
patent: 4799787 (1989-01-01), Mason
patent: 4799788 (1989-01-01), Berthet et al.
patent: 4850661 (1989-07-01), Kawakatsu
patent: 4865406 (1989-12-01), Kageyame
patent: 4896928 (1990-01-01), Perilloux
patent: 4919542 (1990-04-01), Nulman
patent: 4979134 (1990-12-01), Arima et al.
patent: 4983001 (1991-01-01), Hagiuda et al.
patent: 4989970 (1991-02-01), Campbell et al.
patent: 5004913 (1991-04-01), Kleinerman
patent: 5048960 (1991-09-01), Hayashi et al.
patent: 5154512 (1992-10-01), Schietinger et al.
patent: 5156461 (1992-10-01), Moslehi et al.
patent: 5166080 (1992-11-01), Schietinger et al.
patent: 5180226 (1993-01-01), Moslehi
patent: 5255286 (1993-10-01), Moslehi et al.
patent: 5270222 (1993-12-01), Moslehi
patent: 5310260 (1994-05-01), Schietinger et al.
patent: 5318362 (1994-06-01), Schietinger et al.
Accufiber Application Note, "New Ways to Improve RTP Through Optical Fiber Thermometry", pp. 1-16, Jul. 28, 1989.
"Rapid Thermal Processing: Equipment Issues for High Volume Production Environments", by Stultz, Peaks Systems, Inc., Fremont, California.
"Process Control for a Rapid Optical Annealing System", by Gelpey et al., pp. 199-207.
"Rapid Annealing Using Halogen Lamps", by Kato et al., Suwu Seikosha Co., Ltd., Nagano, Japan, J. Electrochem. Soc., vol. 131, No. 5, pp. 1145-1152, May 1984.
"Will RTP Emerge as the Cinderella Technology of the '90s?", by Singer, Semiconductor International, Mar. 1989.
"Rapid Thermal Processing", Semiconductor International, Mar. 1989.
"Temperature Control and Temperature Uniformity during Rapid Thermal Processing", by Vandenabeele et al., pp. 185-202.
"Ripple Technique: A Novel Non-Contact Wafer Emissivity and Temperature Method for RTP", by Schietinger et al., Mat. Res. Soc. Symp. Proc., vol. 224, 1991 Materials Research Society.
"In Situ Emissivity Measurements to Probe the Phase Transformations during Rapid Thermal Processing Co Silicidation", by Schreutelkamp et al., Appl. Phys. Lett., vol. 61, No. 19, pp. 2296-2298, Nov. 9, 1992.
"In-Situ Emissivity and Temperature Measurement during Rapid Thermal Processing (RTP)", by Vandenabeele et al., Apr. 1992.

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