Non-collinear end-to-end structures with sub-resolution...

Details Non-collinear end-to-end structures with sub-resolution... Non-collinear end-to-end structures with sub-resolution...

2005-12-07

2009-08-11

Huff, Mark F (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S311000, C716S030000, C716S030000

Reexamination Certificate

active

07572557

ABSTRACT:
Sub-resolution assist features for non-collinear features are described for use in photolithography. A photolithography mask with elongated features is synthesized. An end-to-end gap between two features if found for which the ends of the two features facing the gap are linearly offset from one another. A sub-resolution assist feature is applied to the end-to-end gap between the elongated features, and the synthesized photolithography mask is modified to include the sub-resolution assist feature.

REFERENCES:
patent: 2003/0208742 (2003-11-01), LaCour
patent: 2004/0091790 (2004-05-01), Chen et al.
patent: 2005/0202321 (2005-09-01), Gordon et al.
patent: 2006/0019202 (2006-01-01), Houston et al.

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