Nitrogen-containing organic compound, resist composition and...

Details Nitrogen-containing organic compound, resist composition and... Nitrogen-containing organic compound, resist composition and...

2007-10-24

2009-12-08

Walke, Amanda C. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C544S001000, C546S001000, C548S100000

Reexamination Certificate

active

07629108

ABSTRACT:
A resist composition comprising as a quencher a nitrogen-containing organic compound bearing a nitrogen-containing heterocycle and having a molecular weight of at least 380 exhibits a high resolution and satisfactory mask coverage dependence and is useful in microfabrication using electron beam or deep-UV.

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W. Hinsberg et al. J. Photoply. Sci. and Tech., vol. 6, No. 4 , pp. 535-546 (1993).
T. Kumada et al., J. Photoplym Sci. and Tech., vol. 6, No. 4, pp. 571-574 (1993).
Hatakeyama et al., J. Photoplym. Sci. and Tech., vol. 13, No. 4, pp. 535-546 (1993).

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