Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-10-02
2007-10-02
Lee, Sin (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S326000, C430S325000, C430S330000
Reexamination Certificate
active
10984933
ABSTRACT:
Chemically amplified resist compositions comprising nitrogen-containing organic compounds having an aromatic carboxylic acid ester structure have an excellent resolution and provide a precise pattern profile and are useful in microfabrication using electron beams or deep-UV light.
REFERENCES:
patent: 4491628 (1985-01-01), Ito et al.
patent: 5104770 (1992-04-01), Usifer et al.
patent: 5310619 (1994-05-01), Crivello et al.
patent: 6004724 (1999-12-01), Yamato et al.
patent: 6261738 (2001-07-01), Asakura et al.
patent: 41-19064 (1964-11-01), None
patent: 63-27829 (1988-02-01), None
patent: 2-27660 (1990-06-01), None
patent: 5-158239 (1993-06-01), None
patent: 5-232706 (1993-09-01), None
patent: 5-249662 (1993-09-01), None
patent: 5-249683 (1993-09-01), None
patent: 5-257282 (1993-10-01), None
patent: 5-289322 (1993-11-01), None
patent: 5-289340 (1993-11-01), None
patent: 6-194834 (1994-07-01), None
patent: 6-242605 (1994-09-01), None
patent: 6-242606 (1994-09-01), None
patent: 6-263716 (1994-09-01), None
patent: 6-263717 (1994-09-01), None
patent: 6-266100 (1994-09-01), None
patent: 6-266111 (1994-09-01), None
patent: 7-92678 (1995-04-01), None
patent: 7-92680 (1995-04-01), None
patent: 7-92681 (1995-04-01), None
patent: 7-120929 (1995-05-01), None
patent: 7-128859 (1995-05-01), None
patent: 7-134419 (1995-05-01), None
patent: 9-95479 (1997-04-01), None
patent: 9-208554 (1997-08-01), None
patent: 9-230588 (1997-09-01), None
patent: 9-301948 (1997-11-01), None
patent: 2906999 (1999-04-01), None
patent: 2000-314956 (2000-11-01), None
Chemical Abstract 66:25580—Uhlig et al.
Chemical Abstract 66:37778—Irikura et al.
Chemical Abstract 71:61225—Carlsson et al.
Chemical Abstract 85:177086—Takai et al.
Chemical Abstract 123:355077—Stebani et al.
Chemical Abstract 135:371308—Kubo et al.
Chemical Abstract 136:381993—Boon et al.
Chemical Abstract 69:51952—Oshiro et al.
Chemical Abstract 77:151844—Schultz et al.
Chemical Abstract 89:24213—Ochi et al.
Chemical Abstract 102:132037—Hofman et al.
Chemical Abstract 129:330308—Starkey et al.
Hatakeyama, et al. “Investigation of Discrimination Enhancement with New Modeling for Poly-Hydroxystyrene Positive Resists” Journal of Photopolymer Science and Technology, vol. 13, No. 4, (2000) pp. 519-524.
Hinsberg, et al. “Fundamental Studies of Airborne Chemical Contamination of Chemically Amplified Resists” Journal of Photopolymer Science and Technology, vol. 6; No. 4 (1993) pp. 535-546.
Kumada, et al. “Study on Over-Top Coating of Positive Chemical Amplification Resists for KrF Excimer Laser Lithography” Journal of Photopolymer Science and Technology, vol. 6; No. 4 (1993) pp. 571-574.
Arimitsu, et al., “Sensitivity Enhancement of Chemical-Amplification-Type Photoimaging Materials by Acetoacetic Acid Derivatives” Journal of Photopolymer Science and Technology, vol. 8; No. 1 (1995) pp. 43-44.
Kudo, et al. “Enhancement of the Senesitivity of Chemical-Amplification-Type Photoimaging Materials by β-Tosyloxyketone Acetals.” Journal of Photopolymer Science and Technology vol. 8; No. 1 (1995) pp. 45-46.
Arimitsu, et al. “Effect of Phenolic Hydroxyl Residues on the Improvement of Acid-Proliferation-Type Photoimaging Materials” Journal of Photopolymer Science and Technology, vol. 9, No. 1 (1996) pp. 29-30.
Hasegawa Koji
Kinsho Takeshi
Kobayashi Katsuhiro
Noda Kazumi
Takemura Katsuya
Lee Sin
Shin-Etsu Chemical Co. , Ltd.
LandOfFree
Nitrogen-containing organic compound, resist composition and... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Nitrogen-containing organic compound, resist composition and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Nitrogen-containing organic compound, resist composition and... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3889339