Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-08-28
2007-08-28
Gilliam, Barbara (Department: 1709)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C549S432000, C549S436000
Reexamination Certificate
active
11110927
ABSTRACT:
Chemically amplified resist compositions comprising nitrogen-containing organic compounds having a 7-oxanorbornane-2-carboxylic ester structure have resolution and provide a precise pattern profile and are useful in microfabrication using electron beams or deep-UV light.
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Hasegawa Koji
Noda Kazumi
Takemura Katsuya
Watanabe Takeru
Gilliam Barbara
Shin-Etsu Chemical Co. , Ltd.
Thompson-Rummel Ponder
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