Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1991-06-28
1993-08-03
Weisstuch, Aaron
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
2041922, C23C 1435
Patent
active
052325709
ABSTRACT:
A hard protective material and method for forming the medium having the formula C.sub.x N.sub.y. The medium may be formed as a protective film on a magnetic recording disk in a sputtering apparatus such as a magnetron apparatus. The amount of nitrogen in the film may be affected by controlling the collisions of the sputtered material between the target and deposition substrate by controlling the bombardment of the substrate by electrons. The films exhibit properties indicative of a textured morphology on a nanoscale which enhances the retention of lubricant overcoats.
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Byun Chongwon
Haines William G.
Johns Earl
Ng Quock
Rauch Gary C.
Digital Equipment Corporation
Weisstuch Aaron
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