Nitride semiconductor element

Active solid-state devices (e.g. – transistors – solid-state diode – Incoherent light emitter structure – With housing or contact structure

Reexamination Certificate

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Details

C257S013000, C257S079000, C257S080000, C257S086000, C257S094000, C257S103000, C257S184000, C257S431000, C257S432000, C257S436000

Reexamination Certificate

active

06921928

ABSTRACT:
In the nitride semiconductor device having a p-type nitride semiconductor layer, an electrode including at least rhodium and iridium is formed on the p-type nitride semiconductor layer. By this construction, an excellent ohmic contact between the electrode and the p-type nitride semiconductor layer and a high reflectivity in the electrode can be obtained, so that the nitride semiconductor device having excellent external quantum efficiency can be provided.

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patent: 5990500 (1999-11-01), Okazaki
patent: 6100174 (2000-08-01), Takatani
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patent: 2003/0038294 (2003-02-01), Sano
patent: 2003/0162342 (2003-08-01), Chen et al.
patent: 2003/0209717 (2003-11-01), Okazaki
patent: 2003/0227065 (2003-12-01), Senda et al.
patent: 2004/0229429 (2004-11-01), Nagano et al.
patent: 11-274562 (1999-10-01), None
patent: 2000-299528 (2000-10-01), None
patent: 2001147223 (2001-05-01), None

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