Electron beam exposure apparatus, deflection apparatus, and...

Details Electron beam exposure apparatus, deflection apparatus, and... Electron beam exposure apparatus, deflection apparatus, and...

2005-07-19

2005-07-19

Wells, Nikita (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492200, C250S492300

Reexamination Certificate

active

06919574

ABSTRACT:
An electron beam exposure apparatus for exposing a wafer by an electron beam incorporates a circuit structure for conducting a scan test to self-diagnose the electrical connections. The electron beam exposure apparatus includes: an electron beam generating section for generating the electron beam; a plurality of deflectors for deflecting the corresponding electron beams; a deflection control section for outputting a deflection control signal for causing the deflector to deflect the electron beam; and a control signal storage section for storing a value of the deflection control signal output from the deflection control section. The control signal storage section connects the plurality of deflectors in series when conducting the scan test. The control signal storage section and the deflector may be monolithically integrated on a semiconductor substrate.

REFERENCES:
patent: 3644700 (1972-02-01), Kruppa et al.
patent: 4145597 (1979-03-01), Yasuda
patent: 4437008 (1984-03-01), Matsuda et al.
patent: 5448075 (1995-09-01), Fueki et al.
patent: 5557314 (1996-09-01), Okamoto et al.
patent: 6703624 (2004-03-01), Hamaguchi et al.

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