Neutral sputtered films of metal alloy oxides

Details Neutral sputtered films of metal alloy oxides Neutral sputtered films of metal alloy oxides

1988-04-01

1989-05-30

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

428432, 428630, C23C 1434, C23C 1408, C23C 1418

Patent

active

048348570

ABSTRACT:
A method for producing visually neutral high transmittance low emissivity coated articles comprising infrared reflective metal and antireflective metal oxide layers and an improved multiple layer coated article produced thereby, comprising a high refractive index neutral metal oxide layer between the antireflective metal oxide layer and the infrared reflective metal layer are disclosed.

REFERENCES:
patent: Re27473 (1972-09-01), Mauer
patent: 4048372 (1977-09-01), Ando et al.
patent: 4094763 (1978-06-01), Gillery et al.
patent: 4113599 (1978-09-01), Gillery
patent: 4166018 (1979-08-01), Chapin
patent: 4201649 (1980-05-01), Gillery
patent: 4322276 (1982-03-01), Meckel et al.
patent: 4327967 (1982-05-01), Groth
patent: 4337990 (1982-07-01), Fan et al.
patent: 4349425 (1982-09-01), Miyake et al.
patent: 4413877 (1983-11-01), Suzuki et al.
patent: 4462883 (1984-07-01), Hart
patent: 4497700 (1985-02-01), Groth et al.
patent: 4548691 (1985-10-01), Dietrich et al.
patent: 4610771 (1986-09-01), Gillery
patent: 4716086 (1987-12-01), Gillery et al.

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