Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2008-07-08
2008-07-08
Lin, Sun James (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000, C716S030000
Reexamination Certificate
active
11283569
ABSTRACT:
A computer network for generating instructions for photomask manufacturing equipment, based on photomask specification data input by a customer. A series of order entry screens are downloaded to a remote customer's computer, typically via an internet connection. The customer is prompted to enter photomask specification data, which is delivered to computing equipment on the manufacturer's local network. The manufacturer's computing equipment validates the photomask specification data, and uses this data to generate fracturing instructions and equipment control instructions. The fracturing instructions, together with pattern design data from the customer, are delivered to a fracture engine, which provides fractured pattern data. The control instructions and the fractured pattern data may then be electronically delivered to the manufacturing equipment.
REFERENCES:
patent: 5416772 (1995-05-01), Edwards et al.
patent: 5539975 (1996-07-01), Kukuljan et al.
patent: 5625801 (1997-04-01), Fukuya
patent: 5694551 (1997-12-01), Doyle et al.
patent: 5732218 (1998-03-01), Bland et al.
patent: 5825651 (1998-10-01), Gupta et al.
patent: 5844810 (1998-12-01), Douglas et al.
patent: 5870719 (1999-02-01), Maritzen et al.
patent: 5920846 (1999-07-01), Storch et al.
patent: 5933350 (1999-08-01), Fujimoto et al.
patent: 5950201 (1999-09-01), Van Huben et al.
patent: 5963953 (1999-10-01), Cram et al.
patent: 5969973 (1999-10-01), Bourne et al.
patent: 6003012 (1999-12-01), Nick
patent: 6009406 (1999-12-01), Nick
patent: 6023565 (2000-02-01), Lawman et al.
patent: 6023699 (2000-02-01), Knoblock et al.
patent: 6076080 (2000-06-01), Morscheck et al.
patent: 6154738 (2000-11-01), Call
patent: 6330708 (2001-12-01), Parker et al.
patent: 6760640 (2004-07-01), Suttile et al.
patent: 2004/0025137 (2004-02-01), Croke et al.
patent: 1 003 087 (2000-05-01), None
Peltier et al. “MIDAS: The Multichip Module Designers' Access Service” ISHM '95 Proceedings (pp. 543-547), Oct. 25, 1995.
Office Action for European Patent Application No. EP01952380.2 (8 pages), Nov. 28, 2006.
PCT Written Opinion PCT/US01/21020, Mailed Jan. 3, 2003.
Peltier, J. et al. “Low cost, prototype ASIC and MCM fabrication and assembly from the MOSIS service” Proceedings. 1997 IEEE, pp. 68-69, XP002199595, 1997.
Luo et al. “Desktop Rapid Prototyping System With Supervisory Control and Monitoring Through Internet” IEEE/ASME Transactions on Mechatronics vol. 6, No. 4; pp. 399-409. XP002199596, Dec. 2001.
PCT /US 01/21020 Search Report, Mailed Jun. 6, 2002.
Suttile et al., “Streamlining the frontend reticle fabrication process by improving mask ordering”, MicroMagazine.com, Jun. 2002.
Photoplot Store at http://web.archive.org/web/20000614112553/http://www.photoplotstore.com/, Jun. 2000.
Cogdell Thomas T.
Gentry Jan E.
Schepp Jeffry S.
Baker & Botts L.L.P.
Lin Sun James
Toppan Photomasks, Inc.
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