Negatively acting photoresist composition based on polyimide pre

Details Negatively acting photoresist composition based on polyimide pre Negatively acting photoresist composition based on polyimide pre

1998-09-10

2000-01-04

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430311, 430325, 522141, 522142, 522146, 522164, G03F 7038, G03F 730

Patent

active

060108258

ABSTRACT:
A negatively operating photoresist composition comprising: (a) a polyimide precursor containing repeating structural units of formula (1) ##STR1## the composition comprises in all as many structural units of formula (I), which have residues R.sub.2, that the composition can be developed by means of aqueous-alkaline developers for photoresists, which are free of organic solvents.

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