Negative-working resist composition for electron beams or...

Details Negative-working resist composition for electron beams or... Negative-working resist composition for electron beams or...

2005-05-03

2005-05-03

Walke, Amanda (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S296000, C430S914000

Reexamination Certificate

active

06887647

ABSTRACT:
A negative-working resist composition for electron beams or X-rays comprising (A) a compound generating a sulfonic acid by the irradiation of electron beams or x-rays, (B) a resin which is insoluble in water and soluble in an alkali aqueous solution, (C) a crosslinking agent crosslinking with the resin (B) by the action of an acid, and (D) a compound generating a carboxylic acid having a specific structure by the irradiation of electron beams or x-rays.

REFERENCES:
patent: 5595855 (1997-01-01), Padmanaban et al.
patent: 6136500 (2000-10-01), Kobayashi et al.
patent: 6291129 (2001-09-01), Shida et al.
patent: 1076261 (2001-02-01), None
patent: 9-43837 (1997-02-01), None
patent: 11-125907 (1999-05-01), None

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