Negative-working radiation-sensitive mixtures, and radiation-sen

Details Negative-working radiation-sensitive mixtures, and radiation-sen Negative-working radiation-sensitive mixtures, and radiation-sen

1992-04-20

1993-07-27

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430270, 430281, 430325, 522 50, G03F 7038, G03F 730

Patent

active

052309851

ABSTRACT:
A negative-working radiation-sensitive mixture containing

REFERENCES:
patent: 3692560 (1972-09-01), Jurgen et al.
patent: 4376818 (1983-03-01), Ohashi et al.
patent: 4840867 (1989-06-01), Elsaesser et al.
Houlihan, "An Evaluation of Nitrobenzyl Ester Chemistry for Chemical Amplification Resists", SPIE, vol. 920, Advances in Resist Technology and Processing, 1988, pp. 67-73.
Crivello, "Possibilities for Photoimaging Using Onium Salts", Polymer Engineering and Science, Mid-December, 1983, vol. 23, pp. 953-956.
Willson, "Organic Resist Materials--Theory and Chemistry", Introduction to Microlithography, 1983.

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