Negative-working radiation-sensitive mixture, and radiation-sens

Details Negative-working radiation-sensitive mixture, and radiation-sens Negative-working radiation-sensitive mixture, and radiation-sens

1992-04-20

2000-05-16

Codd, Bernard

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

4302701, 430325, 430921, G03C 173

Patent

active

060635452

ABSTRACT:
A negative-working radiation-sensitive mixture containing

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patent: 5118582 (1992-06-01), Ueno et al.
F.M. Houlihan, "An Evaluation of Nitrobenzyl Ester Chemistry for Chemical Amplification Resists", SPIE Proc., Adv. in Resist Techn. and Proc., vol. 920, 1988, pp. 67-74.
C.G. Willson, "Organic Resist Materials--Theory and Chemistry", Introduction to Microlithography ACS Symp. Ser. 219, 1983, pp. 88-159.
J. Crivello, "Possibilities for Photoimaging Using Onium Salts", Polym. Eng. Sci., vol. 23, No. 17, 1983, pp. 953-956.
T. Ueno et al., "Chemical Amplification Positive Resist Systems Using Novel Sulfonates as Acid Generators", Polymers for Microelectronics--Science and Technology, 1989, pp. 66-67.
Peter, et al., "A New Photoinitiator System For Radical and Cationic Polymerization", Chemical Abstracts, vol. 92, Jun. 16, 1980, p. 6, Abstract No. 198859C.
F.M. Houlihan et al, "An Evaluation of Nitrobenzyl Ester Chemistry for Chemical Amplification Resists," SPIE Proc., Adv. in Resist Techn. and Proc., vol. 920, 1988, pp. 67-74.
T. Ueno et al, "Chemical Amplification Positive Resist System Using Novel Sulfonatesos Acid Generators," Polymers for Microelectronics--Science and Technology, 1989, pp. 66-67.

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