Negative-working polymers useful as X-ray or E-beam resists

Details Negative-working polymers useful as X-ray or E-beam resists Negative-working polymers useful as X-ray or E-beam resists

1987-02-02

1989-01-03

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430287, 430966, 430967, 526240, 526262, 526293, 526296, G03C 500, G03C 168, C08F 2240

Patent

active

047956925

ABSTRACT:
Radiation-sensitive interpolymers comprising 10-90 mole % of a polymerized maleimide monomer are useful as resists having high sensitivity to E-beams or X-rays.

REFERENCES:
patent: 2650215 (1953-08-01), Strain
patent: 3857822 (1974-12-01), Frass
patent: 4158731 (1979-06-01), Baumann et al.
patent: 4289842 (1981-09-01), Tan et al.
patent: 4532332 (1985-07-01), Muller
patent: 4568734 (1986-02-01), Tan et al.
Chemical Abstracts, 4188j, vol. 76, 1972, p. 2.

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