Negative-working polymers useful as electron beam resists

Details Negative-working polymers useful as electron beam resists Negative-working polymers useful as electron beam resists

1980-06-27

1981-09-15

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430281, 430287, 430296, 20415922, 526288, 526304, 526320, G03C 168

Patent

active

042898420

ABSTRACT:
Novel acrylate copolymer materials function as electron-beam resists with enhanced sensitivity and enhanced plasma etch resistance. The method of using such materials as an electron-beam resist is also described.

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Yau et al., J. Vac. Sci. Technol vol. 15 No. 3 pp. 960-964 (May/Jun. 11978).

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