Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1986-11-21
1988-05-10
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430286, 430914, 430920, 522 25, G03C 176
Patent
active
047435305
ABSTRACT:
A negative working photoresist is disclosed responsive to imaging radiation of a wavelength longer than 550 nm comprised of an organic film forming component containing ethylenic unsaturation and capable of selective immobilization by addition at the site of ethylenic unsaturation and activator and photosensitizer coinitiators for ethylenic addition. The activator is an azinium salt activator, and the photosensitizer is a dye having its principal absorption peak at a wavelength longer than 550 nm and having a reduction potential which in relation to that of said azinium salt activator is at most 0.1 volt more positive.
REFERENCES:
patent: Re27922 (1974-02-01), Heseltine et al.
patent: Re27925 (1974-02-01), Jenkins et al.
Research Disclosure, vol. 200, Dec. 1980, Item 20036.
Specht, Martic, and Farid, "A New Class of Triplet Sensitizers", Tetrahedron, vol. 38, pp. 1203-1211, 1982.
Farid Samir Y.
Haley Neil F.
Moody Roger E.
Specht Donald P.
Brammer Jack P.
Eastman Kodak Company
Thomas Carl O.
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