Negative working photoresist composition based on polyimide prim

Details Negative working photoresist composition based on polyimide prim Negative working photoresist composition based on polyimide prim

1997-02-14

1999-01-05

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

522 77, 522 99, 522136, 522142, 430325, 430311, 430330, G03F 7038, G03F 730

Patent

active

058560653

ABSTRACT:
Negative working photoresist compositions containing:

REFERENCES:
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patent: 4515887 (1985-05-01), Davis
patent: 4579809 (1986-04-01), Irving
patent: 4604342 (1986-08-01), Sondergeld et al.
patent: 5019482 (1991-05-01), Ai et al.
patent: 5302489 (1994-04-01), Shu
K.K. Dietliker in "Chemistry and Technology of UV & EB Formulation for Coatings, Inks and Paints", vol. III: Photoinitiators For Free Radical And Cationic Polymerization, pp. 115-352.
Chem. Rev. 1993, "Photoinitiators For Free-Radical-Initiated Photoimaging Systems", pp. 435-448.

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