Negative working photoresist composition

Details Negative working photoresist composition Negative working photoresist composition

1999-01-13

2000-08-15

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

G03F 7004

Patent

active

061034495

ABSTRACT:
A negative working photoresist composition which has high suitability for exposure to far ultraviolet and comprises an alkali-soluble resin, a compound capable of generating an acid upon irradiation with actinic rays or radiations, and a compound capable of lowering the solubility of the alkali-soluble resin in a developer in the presence of the acid, the alkali-soluble resin comprising a polymer containing at least the repeating units derived from norbornene skeleton-containing monomers and crosslinking groups. ##STR1##

REFERENCES:
patent: 4571375 (1986-02-01), Benedikt
patent: 5843624 (1998-12-01), Houlihan et al.
patent: 5932391 (1999-08-01), Ushirogouchi et al.
patent: 6027856 (2000-02-01), Nozaki et al.
"Alicyclic Polymers . . . ", Okoroanyanwu, U. et al, Oct. 22, 1998, 10, pp. 3319-3327.

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