Negative-working, non-swelling resist

Details Negative-working, non-swelling resist Negative-working, non-swelling resist

1986-09-02

1987-05-26

Schilling, Richard L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Readily visible image formation

430270, 430338, 430915, 430927, G03C 1727, G03C 1733, G03F 726

Patent

active

046686088

ABSTRACT:
There are disclosed negative-working resist compositions featuring a binder and a radiation-sensitive compound that loses HX upon exposure, to become less soluble in an aqueous base. X is selected from the group consisting of --CN, halide, and --SO.sub.2 R.sup.1 and R.sup.1 is alkyl of 1-5 carbon atoms or aryl of from 6 to 10 carbon ring atoms.

REFERENCES:
patent: 2855303 (1958-10-01), Chalkley
patent: 3131062 (1964-04-01), Agtuss
patent: 3306748 (1967-02-01), Chalkley
patent: 4006023 (1977-02-01), McLaughlin et al.
patent: 4255513 (1981-03-01), Laridon et al.
patent: 4373017 (1983-02-01), Masukawa et al.
"Dosimetry for Lithographic Applications", J. Vac. Sci. Technol., vol. 19, No. 4, Nov./Dec. 1981, pp. 1343-1347, Shaw et al.
J. of Organic Chemistry of the USSR, vol. 8, pp. 1701-1705, 1973.

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