Organic compounds -- part of the class 532-570 series – Organic compounds – Nitriles
Patent
1998-10-28
1999-11-23
Higel, Floyd D.
Organic compounds -- part of the class 532-570 series
Organic compounds
Nitriles
430325, 430328, 430330, 430332, 430334, C07C25500
Patent
active
059903384
ABSTRACT:
Disclosed is a novel positive-working or negative-working chemical-sensitization photoresist composition useful in the photolithographic patterning works for the manufacture of electronic devices. The photoresist composition is characterized by a unique acid-generating agent capable of releasing an acid by the pattern-wise exposure of the resist layer to actinic rays so as to increase or decrease the solubility of the resist layer in an aqueous alkaline developer solution. The acid-generating agent proposed is a novel cyano group-containing oxime sulfonate di- or triester compound represented by the general formula
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Hada Hideo
Komano Hiroshi
Sugeta Yoshiki
Yamazaki Hiroyuki
Higel Floyd D.
Tokyo Ohka Kogyo Co. Ltd.
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