Negative type resist composition

Details Negative type resist composition Negative type resist composition

2003-09-17

2009-11-10

Walke, Amanda C. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S914000, C430S921000

Reissue Patent

active

RE040964

ABSTRACT:
A negative type resist composition is provided, which provides excellent resolution, satisfactory profile and outstanding process stability; is suitable for exposure using deep ultra violet ray; and comprises alkali soluble resin, acid generator, crosslinking agent, and a basic compound represented by the following formula (I)wherein, A representsinsert-start id="INS-S-00001" date="20091110" ?sulfide group, disulfide group orinsert-end id="INS-S-00001" ?bivalent aliphatic hydrocarbon residue which may be optionally interrupted by imino group,delete-start id="DEL-S-00001" date="20091110" ?sulfide group, or disulfide group,delete-end id="DEL-S-00001" ?X represents nitrogen atom or C(NH2), and R1and R2independently represent hydrogen or alkyl.

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