Negative type radiation-sensitive resin composition

Details Negative type radiation-sensitive resin composition Negative type radiation-sensitive resin composition

1992-11-13

1994-12-27

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430270, 430281, 430325, 430192, G03C 152

Patent

active

053764986

ABSTRACT:
A negative type radiation-sensitive resin composition which comprises (A) an alkali-soluble resin, (B) a compound which generates an acid upon irradiation, and (C) an aromatic compound having, as functional groups, an --OR group and a --CH.sub.2 OX group, both directly bonded to the aromatic ring in which R represents a substituted methyl group, a substituted ethyl group, a silyl group, an alkoxycarbonyl group or an acyl group and in which X represents a hydrogen atom, an alkyl group having 1-5 carbon atoms or an R group which is as defined above, said aromatic compound being capable of cross-linking the alkali-soluble resin (A) in the presence of an acid, and optionally (D) a specific phenolic compound. The negative type radiation-sensitive resin composition is excellent in developability, pattern-formation, resolution and thermal durability.

REFERENCES:
patent: 4929536 (1990-05-01), Spak et al.
patent: 4931381 (1990-06-01), Spak et al.
patent: 5217840 (1993-06-01), Spak et al.

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