Negative type photosensitive electrodepositing resin composition

Details Negative type photosensitive electrodepositing resin composition Negative type photosensitive electrodepositing resin composition

1991-10-11

1995-04-04

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430285, 430287, 430324, 430908, 430910, 430917, 2041806, 2041814, 522 16, G03C 1725, C25D 1300, C08F 246

Patent

active

054036984

ABSTRACT:
A negative type photosensitive electrodepositing resin composition comprising (a) a polymer obtained by neutralizing a copolymer of acrylic or methacrylic acid and having an acid number of 20 to 300 with a basic organic compound, (b) a non-water-soluble monomer having two or more photopolymerizable unsaturated bonds in the molecule, (c) a non-water-soluble photoinitiator, and (d) a benzotriazole derivative having one or more carboxyl groups, is effective for giving electrodeposited films with a low voltage or low electric current in a short time, and usable for forming resist patterns with high degree of resolution.

REFERENCES:
patent: 4268610 (1981-05-01), Roos
patent: 4680249 (1987-07-01), Weed
patent: 4710262 (1987-12-01), Weed
patent: 4741987 (1988-05-01), Tohda et al.
patent: 5102775 (1992-04-01), Okuhara et al.

Affiliated with

Also associated with

Rating

Negative type photosensitive electrodepositing resin composition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Negative type photosensitive electrodepositing resin composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Negative type photosensitive electrodepositing resin composition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2379944