Negative type deep ultraviolet resist

Details Negative type deep ultraviolet resist Negative type deep ultraviolet resist

1979-12-10

1981-05-12

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

20415914, 20415922, 430286, 430288, 430302, 430306, 526323, G03C 168

Patent

active

042672589

ABSTRACT:
A negative type resist is provided for deep ultraviolet light lithography. This resist comprises a polymer of a diallyl ester of a dicarboxylic acid having a degree of dispersion of 3 or less, which is given by the ratio of a weight-average molecular weight Mw to a number-average molecular weight Mn. This deep UV resist can produce a fine detail resist pattern having a high resolution, and it has a high sensitivity to irradiating the coated film of the polymer on a substrate with deep UV light followed by development.

REFERENCES:
patent: 3087915 (1963-04-01), Heiberger et al.
patent: 3113123 (1963-12-01), Heiberger et al.
patent: 3475176 (1969-10-01), Rauner

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