Negative type composition for chemically amplified resist and pr

Details Negative type composition for chemically amplified resist and pr Negative type composition for chemically amplified resist and pr

1996-10-23

1998-03-03

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430327, 430330, G03F 716

Patent

active

057232598

ABSTRACT:
A composition for negative type chemically amplified resist including, as main components, a random copolymer of vinyl phenol and vinyl cyclohexanol, a melamine resin having an enhanced hexamethoxymethylmelamine content, an acid generator for generating an acid upon irradiation by ionizing radiation, and a solvent. The resist pattern formation process and apparatus are also disclosed.

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patent: 5401614 (1995-03-01), Dichiara et al.
Lamola et. al., "Chemically Amplified Resists", Solid State Technology 53-60 (Aug. 1991).
Frechet at al, "Chapter 5: Nonswelling Negative Resists Incorporating Chemical Amplification", pp. 74-75, from ACS Symposium Series 412: Polymers in Microlithography: Materials and Processes ed. by Reichmanis et al, ACS, 1989.

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