Negative resists based on acid-catalyzed elimination of...

Details Negative resists based on acid-catalyzed elimination of... Negative resists based on acid-catalyzed elimination of...

2007-06-20

2008-07-01

Walke, Amanda C. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S281100, C430S311000, C526S072000, C526S242000, C526S244000, C526S245000, C526S247000, C526S246000, C526S250000, C526S251000, C526S254000, C526S281000

Reexamination Certificate

active

07393624

ABSTRACT:
The present invention provides polymers that are useful in negative resist compositions. Polymers of the present invention comprise (1) a first monomer having a polar functional group; (2) a second monomer; and optionally, (3) a third monomer that imparts at least one characteristic selected from crosslinkable functionality, etch resistance, and solubility modulation. The first monomer provides an acid catalyzed polarity switch upon elimination of the polar functional group, whereas, the second monomer provides aqueous dissolution. The polymers of the present invention may be incorporated into negative resist compositions, which may also include photoacid generators, crosslinking agents, basic compounds, solvents, dissolution accelerators, photobase generators, latent basic compounds, surfactants, adhesion promoters, and anti-foaming agents.

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